Nikon 45nm production immersion scanner : Nikon Corporation has shipped the world’s first immersion lithography system capable of 45 nm production. The NSR-S610C, an ArF immersion scanner with the industry’s highest projection lens NA of 1.30, shipped to a major IC manufacturer. The system is targeted for mass production of 45 nm devices and can also be used for development of 32 nm devices and double patterning. The NSR-S610C was selected over the competition because of its early market introduction and proven ability to print immersion exposures with no immersion-induced defects and overlay equivalent or better than dry systems. The Nikon NSR-S610C builds on Nikon’s immersion expertise.
