 Nikon production immersion scanner
Proprietary Nikon Local Fill Technology is proven to eliminate scanner-induced immersion defects with no bubbles, water spots, or backside wafer contamination. This technology also eliminates evaporation of the immersion fluid, providing a critical advantage in preventing immersion related overlay problems. Nikon’s Tandem Stage utilizes two stages with different functions to increase throughput, improve accuracy, and enhance long-term stability.
Nikon NSR-S609B production immersion scanner
“2006 was a great year for Nikon’s immersion program,” said Kazuo Ushida, President of the Nikon Precision Equipment Company. “In January, we shipped the world’s first production immersion system, the NSR-S609B. Throughout the year, we achieved wins at several accounts by demonstrating our immersion leadership through evaluations and direct comparisons with our competitor’s tool. And, after a one-year, head-to-head evaluation in a customer fab, we secured the immersion business at a major IC manufacturer. The shipment of the NSR-S610C further cements our leadership in immersion technology.”
About Nikon
Since 1980, Nikon Corporation has been revolutionizing lithography with innovative products and technologies. The company is a worldwide leader in lithography equipment for the microelectronics manufacturing industry with more than 7,800 exposure systems installed worldwide. Nikon offers the most extensive selection of production-class steppers and scanners in the industry. These products serve the semiconductor, flat panel display (LCD) and thin-film magnetic head (TFH) industries. Nikon Precision Inc. provides service, training, applications and technical support, as well as sales and marketing for Nikon lithography equipment in North America.
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Nikon 45nm production immersion scanner : Nikon Corporation has shipped the world’s first immersion lithography system capable of 45 nm production. The NSR-S610C, an ArF immersion scanner with the industry’s highest projection lens NA of 1.30, shipped to a major IC manufacturer. The system is targeted for mass production of 45 nm devices and can also be used for development of 32 nm devices and double patterning. The NSR-S610C was selected over the competition because of its early market introduction and proven ability to print immersion exposures with no immersion-induced defects and overlay equivalent or better than dry systems. The Nikon NSR-S610C builds on Nikon’s immersion expertise. 
